http://10.10.120.238:8080/xmlui/handle/123456789/558
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kaith P. | en_US |
dc.contributor.author | Garg P. | en_US |
dc.contributor.author | Bera A. | en_US |
dc.date.accessioned | 2023-11-30T08:41:37Z | - |
dc.date.available | 2023-11-30T08:41:37Z | - |
dc.date.issued | 2023 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.other | EID(2-s2.0-85151516478) | - |
dc.identifier.uri | https://dx.doi.org/10.1063/5.0146126 | - |
dc.identifier.uri | http://localhost:8080/xmlui/handle/123456789/558 | - |
dc.description.abstract | Low-cost, stable, and easy-to-fabricate resistive switching memory (RSM) devices are highly desirable for next-generation nonvolatile memories. Spinel-structured CuFe2O4 (CFO), composed of earth-abundant, environmentally friendly elements, is a multifunctional material mainly featuring super-paramagnetism. This work explores the potential of spin-coated CFO thin films as an active material in RSM. A simple fluorine-doped tin oxide (FTO)/CFO/Ag device shows a bipolar resistive switching behavior with the problems like scattered SET and RESET voltages and endurance deterioration. Adding a TiO2 layer in the conventional device, we overcame the above limitations and achieved additional advantages of multilevel switching and improved temperature stability. The solution-processed FTO/TiO2/CFO/Ag bilayer device shows stable endurance with a maximum ON/OFF ratio of 100 with the ability to have multiple high resistance states and exhibits excellent temperature stability up to 250 °C. Our results further enhance the multifunctionality of CFO with the potential of being low-cost multilevel RSM. © 2023 Author(s). | en_US |
dc.language.iso | en | en_US |
dc.publisher | American Institute of Physics Inc. | en_US |
dc.source | Applied Physics Letters | en_US |
dc.title | Multilevel resistive switching in solution-processed CuFe2O4/TiO2heterostructure | en_US |
dc.type | Journal Article | en_US |
Appears in Collections: | Journal Article |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.